[By NBC-1TV H. J Yook]Advanced Energy Industries, Inc. (Nasdaq:AEIS) today introduced its Paramount® 2 MHz power supply at SEMICON® Korea 2013. The complete Paramount platform, which spans frequencies from 400 kHz to 60 MHz, provides enabling plasma management in complex thin-film processing environments. In sub 22-nm pulsing applications, the industry-leading Paramount RF pulsing provides synchronized, multi-frequency RF power to improve etch rate selectivity, substrate profile control and film uniformity in a wide operating window.

The 2 MHz mid-frequency addition completes the Advanced Energy (AE) Paramount suite of RF power delivery systems and satisfies the industry's exacting requirements for PECVD, dielectric etch and conductor etch applications. Its built-in ability to synchronize with other Paramount units simplifies power supply integration and operation across multiple frequencies, while its advanced pulsing features—such as user-selectable pulse and phase synchronization and sophisticated arc management—provide semiconductor tool manufacturers precise RF control to innovate at the sub-22 nm level and beyond.

Yuval Wasserman, president of AE Thin Films, said, “We expect the comprehensive Paramount product platform to become further established across the industry in etch and deposition processes—both in semiconductor, with the development of advanced materials and new device geometries, and in other thin-film processing applications. The common controls, measurement and advanced features facilitate process integration and optimization across multiple frequencies without the need for customization or complicated protocols. In addition, the Paramount‘s advanced pulsing technology, combined with our Navigator II matching network’s tune-while pulsing capability, delivers exceptional plasma control.”